کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5468227 | 1518925 | 2017 | 17 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Study of physisorption isotherm of water on technical nickel surface with a wide pressure range
ترجمه فارسی عنوان
بررسی ایزوترم فیزوربرای آب بر روی سطح فنی نیکل با محدوده فشار زیاد
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
چکیده انگلیسی
During the pumping process of unbaked all-metal vacuum systems after air exposure, water dominates in a time of â¼105 s (>10â6 Pa). The pumping rates of vacuum systems are difficult to be calculated because of the term of the re-adsorption rates. Under the assumption of quasi-equilibrium state between the adsorption and the gas phases, theoretically, the isotherms of water can be used to solve the pumping equation without the re-adsorption term. Thus, it is important to measure the isotherms of water on technical metal surfaces. In this work, the physisorption isotherm of water on the nickel surface with a wide pressure range (from 1.59 Pa to saturated vapor pressure Ps) is measured using an all-metal apparatus. The results show that the experimental data agree quite well with the empirical isotherm of Redhead within 0.16 ⤠Ï â¤Â 0.95 (Ï = P/Ps, P is the pressure; 1.0 â¤Â θ â¤Â 4.4, and θ is the surface coverage), and the BET isotherm within 0.04 â¤Â Ï â¤Â 0.40 (0.7 â¤Â θ â¤Â 1.5). When 1.59 â¤Â P â¤Â 250 Pa (θ â¤Â 0.85), there is a linear relationship between θ and ln(P). This follows the Temkin isotherm, and it confirms the common experimental phenomenon that parts of the outgassing curves of vacuum systems are approximately P = constant Ã tâ1. The results also indicate that some water is weakly trapped in the pores and the grain boundaries of technical metals, and it diffuses and desorbs very slowly.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 145, November 2017, Pages 123-127
Journal: Vacuum - Volume 145, November 2017, Pages 123-127
نویسندگان
Yanwu Li, Yongjun Cheng, Wenjun Sun, Yongjun Wang, Meng Dong, Lian Chen,