کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
547118 | 871980 | 2012 | 7 صفحه PDF | دانلود رایگان |

The electrical analysis of Ni/n-GaP structure has been investigated by means of current–voltage (I–V), capacitance–voltage (C–V) and capacitance–frequency (C–f) measurements in the temperature range of 120–320 K in dark conditions. The forward bias I–V characteristics have been analyzed on the basis of standard thermionic emission (TE) theory and the characteristic parameters of the Schottky contacts (SCs) such as Schottky barrier height (SBH), ideality factor (n) and series resistance (Rs) have been determined from the I–V measurements. The experimental values of SBH and n for the device ranged from 1.01 eV and 1.27 (at 320 K) to 0.38 eV and 5.93 (at 120 K) for Ni/n-GaP diode, respectively. The interface states in the semiconductor bandgap and their relaxation time have been determined from the C–f characteristics. The interface state density Nss has ranged from 2.08 × 1015 (eV−1 m−2) at 120 K to 2.7 × 1015 (eV−1 m−2) at 320 K. Css has increased with increasing temperature. The relaxation time has ranged from 4.7 × 10−7 s at 120 K to 5.15 × 10−7 s at 320 K.
Journal: Microelectronics Reliability - Volume 52, Issue 6, June 2012, Pages 1005–1011