کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
547118 871980 2012 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Determination of contact parameters of Ni/n-GaP Schottky contacts
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Determination of contact parameters of Ni/n-GaP Schottky contacts
چکیده انگلیسی

The electrical analysis of Ni/n-GaP structure has been investigated by means of current–voltage (I–V), capacitance–voltage (C–V) and capacitance–frequency (C–f) measurements in the temperature range of 120–320 K in dark conditions. The forward bias I–V characteristics have been analyzed on the basis of standard thermionic emission (TE) theory and the characteristic parameters of the Schottky contacts (SCs) such as Schottky barrier height (SBH), ideality factor (n) and series resistance (Rs) have been determined from the I–V measurements. The experimental values of SBH and n for the device ranged from 1.01 eV and 1.27 (at 320 K) to 0.38 eV and 5.93 (at 120 K) for Ni/n-GaP diode, respectively. The interface states in the semiconductor bandgap and their relaxation time have been determined from the C–f characteristics. The interface state density Nss has ranged from 2.08 × 1015 (eV−1 m−2) at 120 K to 2.7 × 1015 (eV−1 m−2) at 320 K. Css has increased with increasing temperature. The relaxation time has ranged from 4.7 × 10−7 s at 120 K to 5.15 × 10−7 s at 320 K.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 52, Issue 6, June 2012, Pages 1005–1011
نویسندگان
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