کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
547229 871991 2012 9 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Wafer-level Cu–Cu bonding technology
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Wafer-level Cu–Cu bonding technology
چکیده انگلیسی

Semiconductor industry currently utilizes copper wafer bonding as one of key technologies for 3D integration. This review paper describes both science and technology of copper wafer bonding with regard to present applications. The classification of Cu bonding, bonding mechanisms, process developments, its microstructure evolution, as well as other characterizations are reviewed. Researches about patterned Cu bonding, future prospects, and 3D integration using Cu bonding are discussed in this paper.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 52, Issue 2, February 2012, Pages 312–320
نویسندگان
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