کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
547446 872001 2011 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Cu wire bond microstructure analysis and failure mechanism
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Cu wire bond microstructure analysis and failure mechanism
چکیده انگلیسی

In this study, copper wire bonding samples were aged at 205 °C in air from 0 h to 2000 h. It was found that the bonding of a Cu wire and an Al pad formed Cu9Al4, CuAl, and CuAl2 intermetallic compounds, and an initial crack was formed by the ultrasonic squeeze effect during thermosonic wire bonding. The cracks grew towards the ball bond center with an increase in the aging time, and the Cl ions diffused through the crack into the ball center. This diffusion caused a corrosion reaction between the Cl ions and the Cu–Al intermetallic phases, which in turn caused copper wire bonding damage.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 51, Issue 1, January 2011, Pages 119–124
نویسندگان
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