کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
547662 1450560 2007 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Micro-mechanical testing of SiLK by nanoindentation and substrate curvature techniques
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Micro-mechanical testing of SiLK by nanoindentation and substrate curvature techniques
چکیده انگلیسی

Advanced micro-mechanical characterization methods provide material properties of thin films for modeling thermo-mechanical behavior of thin films for micro-electronic applications. Here, we focus on the local measurement method of nanoindentation for finding visco-elastic properties, and a global method of substrate curvature testing that provides linear elastic properties. Our specimen SiLK, Dow chemicals, is a low-k dielectric thin polymer film with a thickness of 400 nm, 6 and 8 μm, deposited on Si substrate. Our results show temperature dependent linear elastic and linear visco-elastic material properties for thin film materials.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 47, Issues 2–3, February–March 2007, Pages 248–251
نویسندگان
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