کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
548099 1450543 2016 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Degradation behavior and mechanism of polymer films for high-ohmic resistor protection in a heat and humid environment
ترجمه فارسی عنوان
رفتار تخریب و مکانیزم فیلم های پلیمری برای محافظت از مقاومت بالا در محیط گرما و مرطوب
کلمات کلیدی
فیلم های پلیمری مقاومت در برابر حرارت، مقاومت خیس، واکنش تکامل هیدروژن، واکنش خوردگی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
چکیده انگلیسی


• Performance of coated high-ohmic resistors in heat and humid resistance was studied.
• Polymer films for resistor protection are mainly formed by phenolic and epoxy resins.
• Hydrogen evolution reaction (HER) can occur on polymer film for a working resistor.
• Corrosion resulted from OH− ions generated in HER may lead to polymer degradation.

The protection of polymer films is critical to the reliability of high-ohmic resistors working in a heat and humid environment, and temperature is the main factor resulting in failure of coated resistors. However, in this study hydrogen evolution reaction (HER) and corrosion reaction of OH− ions are found to be another two important factors determining the fate of coated resistors. When temperature effects can be neglected, corrosion resulted from OH− ions generated in HER may be the major reason of polymer degradation, the mechanism of which is discussed based on the polymer films mainly formed by phenolic and epoxy resins.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 57, February 2016, Pages 79–85
نویسندگان
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