کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
548145 872156 2015 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Study of the leakage current suppression for hybrid-Schottky/ohmic drain AlGaN/GaN HEMT
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Study of the leakage current suppression for hybrid-Schottky/ohmic drain AlGaN/GaN HEMT
چکیده انگلیسی


• We propose a 2 zone leakage current suppression model of the HSD-HEMT.
• We use loop-voltage-scanning to analyze the off-state leakage current mechanism.
• The surface trapping/detrapping effect in the loop-voltage-scanning is verified.
• Leakage current hysteresis becomes more intensive with shorter sweep duration.
• Hybrid-Schottky/ohmic drain modulates the electric field at high drain bias.

The leakage current suppression mechanism in AlGaN/GaN High Electron Mobility Transistors (HEMTs) is investigated. It is known that leakage current can cause severe reliability problems for HEMT devices and conventional AlGaN/GaN HEMT devices suffer from detrimental off-state drain leakage current issues, especially under high off-state drain bias. Therefore, a leakage current suppression technique featuring hybrid-Schottky/ohmic-drain contact is discussed. Through the 2-zones leakage current suppression mechanism by the hybrid-Schottky/drain metal including the shielding effect of the rough ohmic-drain metal morphology and the drain side electric field modulation, AlGaN/GaN HEMT featuring this novel technique can significantly enhance the leakage current suppression capability and improve the breakdown voltage. An analytical method using loop-voltage-scanning is proposed to illustrate the optimization procedure of the hybrid-Schottky/ohmic drain metallization on leakage current suppression. Through the comparison of the loop leakage current hysteresis of conventional ohmic drain HEMT and hybrid-Schottky/ohmic drain, the leakage current suppression mechanism is verified through the leakage current considering surface acceptor-like trap charging/discharging model. Device featuring the hybrid-Schottky/ohmic drain technique shows an improvement in breakdown voltage from 450 V (with no Schottky drain metal) to 855 V with a total drift region length of 9 μm, indicating enhanced off-state reliability characteristics for the AlGaN/GaN HEMT devices.

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ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 55, Issue 2, February 2015, Pages 347–351
نویسندگان
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