کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5488824 | 1399585 | 2017 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Er0.4Bi1.6O3 thin films in situ crystallized at low temperature onto the Gd0.1Ce0.9O1.95 bulk electrolytes via Facing-Target Sputtering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Er0.4Bi1.6O3 thin films in situ crystallized at low temperature onto the Gd0.1Ce0.9O1.95 bulk electrolytes via Facing-Target Sputtering Er0.4Bi1.6O3 thin films in situ crystallized at low temperature onto the Gd0.1Ce0.9O1.95 bulk electrolytes via Facing-Target Sputtering](/preview/png/5488824.png)
چکیده انگلیسی
For large-area Er0.4Bi1.6O3 (ESB) films on the Gd0.1Ce0.9O1.95 (GDC) pellets, the 300 nm-thick ESB films were deposited on the 0.2 cm-thick GDC pellets at different temperatures via on-axis sputtering and Facing-Target Sputtering (FTS) for enhancement of the ionic conductivity of the GDC. The ESB films deposited on the GDC pellets via FTS show a good step-coverage and a well-crystallization at a low temperature of 300 °C. The ESB/GDC bilayers with lower activation energy than GDC single layer showed an enhanced ionic conductivity in intermediate-temperature range from 500 to 700 °C. FTS is an attractive method for the ESB film deposition for low-temperature crystallization on the high-roughened GDC pellets.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Current Applied Physics - Volume 17, Issue 5, May 2017, Pages 751-755
Journal: Current Applied Physics - Volume 17, Issue 5, May 2017, Pages 751-755
نویسندگان
Ji-Na Jeung, Ji-Ho Eom, Byeong-Ju Park, Sun-Dong Kim, Soon-Gil Yoon,