Corrigendum to “Low-damage NH3 plasma treatment on SiO2 tunneling oxide of chemically-synthesized gold nanoparticle nonvolatile memory” [Curr. Appl. Phys. 16 (5) (2016) 605−610]

Corrigendum to “Low-damage NH3 plasma treatment on SiO2 tunneling oxide of chemically-synthesized gold nanoparticle nonvolatile memory” [Curr. Appl. Phys. 16 (5) (2016) 605−610]

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Current Applied Physics - Volume 17, Issue 4, April 2017, Page 592

Jer-Chyi Wang, Kai-Ping Chang, Chin-Hsiang Liao, Ruey-Dar Chang, Chao-Sung Lai, Li-Chun Chang,