کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
548995 872317 2014 16 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Modelling RTN and BTI in nanoscale MOSFETs from device to circuit: A review
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Modelling RTN and BTI in nanoscale MOSFETs from device to circuit: A review
چکیده انگلیسی


• Statistical Variability (SV) impact summary on bulk MOSFETs performances Ion and Vt dispersion.
• Single and several fixed charges impact on device performances in interaction with SV.
• Traps dynamics in combination with SV; identification of permanent and recoverable parts.
• Impact of device to device variability comparison with stochastic charge injection.
• Time dependent variability simulation framework from device to circuit; BTI impact on SRAM cells.

In this paper we summarize the impact of Statistical Variability (SV) on device performances and study the impact of oxide trapped charges in combination with SV. Traps time constants are described and analysed in combination with SV and time dependent simulations are performed including SV, random traps and charge injection stochasticity. Finally we demonstrate the necessity of statistical simulations in extracting compact models of aged devices and we address the problem of aged SRAM cell reliability.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 54, Issue 4, April 2014, Pages 682–697
نویسندگان
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