کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
549088 1450549 2013 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Variations in junction capacitance and doping activation associated with electrical stress of InGaN/GaN laser diodes
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Variations in junction capacitance and doping activation associated with electrical stress of InGaN/GaN laser diodes
چکیده انگلیسی


• The reliability of InGan/GaN laser diodes was investigated.
• We have found an initial activation of the p-type dopant.
• We have found the creation of defects that act as non-radiative recombination centers.
• We provide experimental evidences analyzing the threshold current.
• We correlate its changes with electrical and capacitive measurements.

This paper presents a study of the effects of combined electrical and thermal stress tests on commercially-available InGaN-based blue laser diodes. By means of electrical and optical measurements, we have found that stress has two major consequences: (i) an initial decrease in threshold current, which is ascribed to the increase in the activation of p-type dopant, and (ii) a subsequent increase in threshold current, which – based on optical and electrical characterization – is ascribed to the generation/propagation of non-radiative defects within the active region of the devices.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 53, Issues 9–11, September–November 2013, Pages 1534–1537
نویسندگان
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