Photocatalytic decomposition of acetone over dc-magnetron sputtering supported vanadia/TiO2 catalysts

Two series of titania-based photocatalysts were prepared by the sputtering method, in pure Ar atmosphere at a pressure of 0.5 Pa using a vanadium target source in a direct dc mode with a discharge of 300 V. The time of deposition was varied between 1 and 10 min in order to obtain different thickness of vanadium films. The first catalysts series (samples V/TiO2(A)-n) was prepared deposing vanadium on pure TiO2 anatase, while for the second series (samples V/TiO2(AR)-n) the deposition was made onto TiO2 Degussa P25. The samples have been investigated by means of vibrational (DRIFT and Raman) and optical (UV–vis in the DRS mode). Chemical analysis of the samples was made using the ICP-AES technique, while the crystalline structure of the deposed films onto the TiO2 supports was checked by X-ray diffraction (XRD). The samples morphology was analyzed using the AFM microscopy. The photocatalytic decomposition of acetone was considered as a reaction test. The activity of the investigated catalysts was found to be influenced by both the amount of vanadium and the support nature. Among the investigated catalysts V/TiO2(AR)-32 nm exhibited the higher activity. The activity of this catalyst was also superior to that of TiO2 Degussa P25.