Direct observation of the diffusion behavior of an electrodeposition additive in through-silicon via using in situ surface enhanced Raman spectroscopy

Direct observation of the diffusion behavior of an electrodeposition additive in through-silicon via using in situ surface enhanced Raman spectroscopy

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochemistry Communications - Volume 88, March 2018, Pages 34-38

Takayuki Homma, Akira Kato, Masahiro Kunimoto, Masahiro Yanagisawa,