کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
6947486 | 1450551 | 2011 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Cratering response method to study the effect of ultrasonic energy on Cu-wire bonding quality
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
The paper presents a method for 50 μm Cu-wire bonding to study sub-percentage assembly yield loss due to cratering, so called “in-process” cratering. Test vehicle is an audio amplifier device assembled in a surface mount power package (HSOP). The method is based on high temperature aging followed by wire pull testing and has successfully been applied to determine the upper limit of the bond energy process window. After implementation in production, the shift to lower bond energy was controlled via regular ball shear production monitor and “in-process” cratering was no longer observed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 51, Issues 9â11, SeptemberâNovember 2011, Pages 1865-1868
Journal: Microelectronics Reliability - Volume 51, Issues 9â11, SeptemberâNovember 2011, Pages 1865-1868
نویسندگان
R.T.H. Rongen, A. van IJzerloo, C. Cotofana, K.M. Lan,