کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
701712 | 1460827 | 2016 | 4 صفحه PDF | دانلود رایگان |
Layer-by-layer deposition method, in which nanometer-thick film deposition and hydrogen plasma annealing processes were alternatively repeated, was applied to fabricate hydrogenated amorphous carbon films in our present work. It was found that the hydrogen plasma treatment changed the sp2/sp3 ratio due to chemical etching. Consequently, a stable vacuum electron emission with a low threshold field was achieved compared with that from conventionally deposited a-C films. The threshold electric field is as low as 2 V/μm. The influence of the hydrogen plasma chemical annealing on the field emission behavior was systematically investigated. The improvement of field emission characteristics can be attributed to the large field enhancement effect due to the inhomogeneous distribution of nanometer scale sp2 clusters.
Journal: Diamond and Related Materials - Volume 12, Issues 10–11, October–November 2003, Pages 2016–2019