کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7043859 | 1456921 | 2018 | 27 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Treatment of high arsenic content lead copper matte by a pressure oxidative leaching combined with cyclone and vertical electro-deposition method
ترجمه فارسی عنوان
درمان با محتوای آرسنیک بالا مات مسی سرب را با یک شستشوی اکسیداتیو فشار همراه با روش سیکلون و عمودی الکتروپایه
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کلمات کلیدی
جداسازی، اشباع اکسیداتیو فشار، مات سرب مس، سیکلون و رسوب الکترومغناطیسی عمودی،
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
تصفیه و جداسازی
چکیده انگلیسی
In this work, pyrite was first used to precipitate arsenic in lead copper matte as the form of FeAsO4 during pressure oxidative leaching process. Initial content of arsenic in lead copper matte is of 7.92â¯wt%, and concentration of arsenic in leaching liquid can be less than 0.25â¯g·Lâ1 when the dosage of pyrite reaches 10â¯g. Leaching time, liquid-to-solid ratio, oxygen partial pressure, temperature, sulfuric acid concentration, agitation speed, and sodium lignosulfonate content were systematically studied and optimized during pressure oxidative leaching process, and the optimized conditions for pressure oxidative leaching are: leaching time 2â¯h, liquid-to-solid ratio 5:1, oxygen partial pressure 1.2â¯MPa, temperature 150â¯Â°C, sulfuric acid 200â¯g·Lâ1, agitation speed 500â¯r·minâ1, sodium lignosulfonate 4â¯g. A cyclone and vertical electro-deposition method is introduced to treat the above optimized leaching solution. This method is first applied for leaching solution which is obtained from lead copper matte. After having the cyclone and vertical electro-deposition step finished, cathode copper can be greater than 99.00%.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Separation and Purification Technology - Volume 199, 30 June 2018, Pages 282-288
Journal: Separation and Purification Technology - Volume 199, 30 June 2018, Pages 282-288
نویسندگان
Jia-Yuan Li, Tao Wang, Zhong-hui Sun, Jian-Jian Wu, Dian-Ling Shen, Qing Yuan, Xiao-xuan Li, Jun Chen,