کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7128851 | 1461595 | 2018 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Evaluation of residual stress and adhesion of Ti and TiN PVD films by laser spallation technique
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موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Evaluation of residual stress and adhesion of Ti and TiN PVD films by laser spallation technique Evaluation of residual stress and adhesion of Ti and TiN PVD films by laser spallation technique](/preview/png/7128851.png)
چکیده انگلیسی
The laser spallation technique was applied for measurement of residual stress and adhesion of thin films. Two films of different properties, ductile and soft Ti, and hard and brittle TiN, were studied. The films were produced on 304 steel substrate by PVD method. The residual stress value obtained by laser spallation technique LST were compared with stress value from X-ray diffraction method. Good agreement of stress values measured by both methods was attained. Additionally, the interface strength of the films was tested by laser adhesion spallation technique LASAT with use of VISAR system. It was shown that shock wave induced by a nanosecond laser pulse adequately determines properties of PVD thin films on metal substrate.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optics & Laser Technology - Volume 104, August 2018, Pages 140-147
Journal: Optics & Laser Technology - Volume 104, August 2018, Pages 140-147
نویسندگان
J. Radziejewska, A. SarzyÅski, M. Strzelec, R. Diduszko, J. Hoffman,