کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7180368 | 1467835 | 2018 | 27 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Design and characterization of a two-axis, flexure-based nanopositioning stage with 50â¯mm travel and reduced higher order modes
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موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی صنعتی و تولید
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Long range, high precision, XY stages have a multitude of applications in scanning probe microscopy, lithography, micro-AM, wafer inspection and other fields. However, finding cost effective precision motion stages with a range of more than 12â¯mm with a precision better than one micron is a challenge. This study presents parametric design of the two XY flexure-based stages with a travel ranges of up to 50â¯mm and sub-micron resolution. First, the fabrication and testing of a two-axis double parallelogram flexure stage is presented and the results obtained from FEA and experimental measurements are shown to be in good agreement with the analytical predictions for this stage. A modified stage design with reduced higher order modes and same range, is also presented. This modified design is shown to be capable of achieving an open loop resolution of 100â¯nm with a travel range of greater than 50â¯mm. Higher order modes of the modified stage have been shown to be shifted from 25â¯Hz in the double parallelogram flexure (DPF) stage to over 86â¯Hz in the modified DPF stage making it much simpler to design a high speed (>10â¯Hz) controller for the modified stage.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Precision Engineering - Volume 53, July 2018, Pages 236-247
Journal: Precision Engineering - Volume 53, July 2018, Pages 236-247
نویسندگان
Nilabh K. Roy, Michael A. Cullinan,