کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
732971 | 893299 | 2010 | 5 صفحه PDF | دانلود رایگان |

ZnO films were prepared by pulsed laser deposition (PLD) on glass substrate with temperature ranging from room temperature (RT) to 500 °C. All the films formed the hexagonal wurtzite structure and showed the c-axis (0 0 2) preferred orientation. The films deposited at 200 °C showed the narrowest full width at half maximum of both X-ray diffraction (XRD) and rocking curve, largest height grain size, smallest macrostress and least point defects. Meanwhile, it was found that the films deposited at 350 °C displayed the most intense diffraction peak in XRD and a strong UV emission while it showed the most intense defect-related green emission, fastest growth rate and larger macrostress. In addition, the cross section images showed all films grew with a columnar form along (0 0 2) orientation.
Journal: Optics & Laser Technology - Volume 42, Issue 4, June 2010, Pages 556–560