کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
734686 893467 2008 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Investigation on properties of TiO2 thin films deposited at different oxygen pressures
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Investigation on properties of TiO2 thin films deposited at different oxygen pressures
چکیده انگلیسی

TiO2 thin films were prepared by electron beam evaporation at different oxygen partial pressures. The influences of oxygen partial pressure on optical, mechanical and structural properties of TiO2 thin films were studied. The results showed that with the increase of oxygen partial pressure, the optical transmittance gradually increased, the transmittance edge gradually shifted to short wavelength, and the corresponding refractive index decreased. The residual stresses of all samples were tensile, and the value increased as oxygen partial pressure increasing, which corresponded to the evolutions of the packing densities. The structures of TiO2 thin films all were amorphous because deposition particles did not possess enough energy to crystallize.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optics & Laser Technology - Volume 40, Issue 3, April 2008, Pages 550–554
نویسندگان
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