کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
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735455 | 893613 | 2010 | 4 صفحه PDF | دانلود رایگان |
Excimer laser crystallization is the most commonly employed technology for fabricating low temperature polycrystalline silicon (LTPS) thin films. Investigations on the surface roughness of polycrystalline silicon (poly-Si) thin films become an important issue because the surface roughness of poly-Si film is widely believed to be related to its electrical characteristics. A simple optical measurement system for rapid surface roughness measurement of poly-Si thin films is developed in this study. It is found that y=−1.4533x+0.6932 is a trend equation for predicting the surface roughness of poly-Si thin films. The x and y represent the peak power density and the surface roughness of poly-Si thin films, respectively. The incident angle of 60° is a good candidate for measuring the surface roughness of poly-Si thin films. The surface roughness of poly-Si thin films (y) can be directly determined from the peak power density (x). The maximum measurement error rate of the optical measurement system developed is less than 2.1%. The savings in measurement time of the surface roughness of poly-Si thin films is up to 83%.
Journal: Optics and Lasers in Engineering - Volume 48, Issue 12, December 2010, Pages 1166–1169