کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
736826 | 1461866 | 2015 | 11 صفحه PDF | دانلود رایگان |
• The gallium-indium-oxide films/p-Si photodiodes were prepared by sol–gel method.
• Al/(Ga0.4In0.6)2O3/p-Si/Al diodes exhibited a photoconducting behavior.
• These diodes can be used in optoelectronic applications
The conductive gallium-indium-oxide films/p-type silicon heterojunction photodiodes were prepared by sol gel method. The effects of In content (x) on rectification and photoresponse properties of the conductive gallium- indium-oxide films/p-type silicon diodes. The fabricated diodes show a rectifying non- ideal behavior. The ideality factor values obtained from dV/d(lnI) vs. I plots are higher than the ideality factor values obtained from lnI vs. V plots. This confirms that the larger n values could be due to the presence of series resistance, interface states, and the voltage drop across the interfacial layer. The capacitance values of the Al/(Ga1−xInx)2O3/p-Si/Al diode is controlled by bias voltage, frequency, illumination intensity and In content (x) value.The obtained results confirmed that conductive gallium-indium-oxide films/p-type silicon heterojunction diodes can be used as a photodiode in optoelectronic applications.
Journal: Sensors and Actuators A: Physical - Volume 234, 1 October 2015, Pages 212–222