کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
7388 551 2011 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Chemically amplified photoresist for high resolution autoradiography in targeted radiotherapy
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی بیو مهندسی (مهندسی زیستی)
پیش نمایش صفحه اول مقاله
Chemically amplified photoresist for high resolution autoradiography in targeted radiotherapy
چکیده انگلیسی

Evaluation of the intracellular distribution of radionuclides used for targeted radiotherapy (tRT) is essential for accurate dosimetry. Therefore, a direct and quantitative method for subcellular micro-autoradiography using radiation sensitive polymers (PMMA, UV1116 and AZ40XT) was developed. The electron exposure dose in radio-labelled cells due to Auger and internal conversion (IC) electron emissions of indium (111In), a radionuclide currently used for tRT, was calculated using Monte Carlo (MC) simulation. Electron beam lithography using pre-defined exposure doses was used to calibrate the resist response. The topography of the exposed and developed resists was analysed with atomic force microscopy (AFM) and the resulting pattern depth was related to a specific exposure dose. UV1116 exhibited the best contrast as compared to AZ40XT and PMMA, while AZ40XT exhibited the highest sensitivity at low doses (<10 μC/cm2). AFM analysis of the exposure pattern from radio-labelled cells and nuclei in UV1116 revealed a non-uniform distribution of 111In-EGF in the cell and nucleus, consistent with less well-resolved data from confocal microscopy and micro-autoradiography.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Biomaterials - Volume 32, Issue 26, September 2011, Pages 6138–6144
نویسندگان
, , , , , ,