کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7833436 | 1503519 | 2018 | 12 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Oxygen plasma etching of fused silica substrates for high power laser optics
ترجمه فارسی عنوان
اکسیژن پاشش اکسچنج بستر سیلیس مخلوط برای اپتیک لیزر قدرت بالا
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موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
چکیده انگلیسی
Laser damage resistance of a transparent optical component significantly depends on its substrate surface quality. In this work low energy oxygen plasma etching of fused silica (FS) substrates was investigated in terms of plasma ion energy and etching depth. Laser induced damage threshold (LIDT) and surface roughness of experimental samples were measured and compared. The LIDT of plasma treated uncoated FS substrate increased from 5.0â¯Â±â¯0.3â¯J/cm2 up to 75â¯Â±â¯4â¯J/cm2 for 355â¯nm laser ns pulses without any surface roughness deterioration. Anti-reflective (AR) optical interference coating for 355â¯nm wavelength was deposited on plasma etched and non-etched substrates. Measured LIDT of plasma etched and AR coated component was 3.4 times higher comparing to coated non-etched substrate case and reached 14â¯Â±â¯0.7â¯J/cm2. These results demonstrate successful application of low energy oxygen plasma etching for improving laser induced damage performance of uncoated and AR coated fused silica substrate without deterioration of surface roughness. This application could be also successfully extended for production of other transparent high power UV laser optics like polarizers, beam splitters, etc.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 453, 30 September 2018, Pages 477-481
Journal: Applied Surface Science - Volume 453, 30 September 2018, Pages 477-481
نویسندگان
Giedrius AbromaviÄius, Tomas Juodagalvis, Rytis Buzelis, KÄstutis JuÅ¡keviÄius, Ramutis Drazdys, Simonas KiÄas,