کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7834761 | 1503530 | 2018 | 24 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Sub-30â¯nm patterning of molecular resists based on crosslinking through tip based oxidation
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Sub-30â¯nm patterning of molecular resists based on crosslinking through tip based oxidation Sub-30â¯nm patterning of molecular resists based on crosslinking through tip based oxidation](/preview/png/7834761.png)
چکیده انگلیسی
Oxidation Scanning Probe Lithography (o-SPL) is an established method employed for device patterning at the nanometer scale. It represents a feasible and inexpensive alternative to standard lithographic techniques such as electron beam lithography (EBL) and nanoimprint lithography (NIL). In this work we applied non-contact o-SPL to an engineered class of molecular resists in order to obtain crosslinking by electrochemical driven oxidation. By patterning and developing various resist formulas we were able to obtain a reliable negative tone resist behavior based on local oxidation. Under optimal conditions, directly written patterns can routinely reach sub-30â¯nm lateral resolution, while the final developed features result wider, approaching 50â¯nm width.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 442, 1 June 2018, Pages 106-113
Journal: Applied Surface Science - Volume 442, 1 June 2018, Pages 106-113
نویسندگان
Matteo Lorenzoni, Daniel Wagner, Christian Neuber, Hans-Werner Schmidt, Francesc Perez-Murano,