کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7899967 | 1510358 | 2018 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Formation of antireflection structures for silicon in near-infrared region using AlOx/TiOx bilayer and SiNx single-layer
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Formation of antireflection structures for silicon in near-infrared region using AlOx/TiOx bilayer and SiNx single-layer Formation of antireflection structures for silicon in near-infrared region using AlOx/TiOx bilayer and SiNx single-layer](/preview/png/7899967.png)
چکیده انگلیسی
Antireflection (AR) layers for Si were investigated for applications in optical communication in the wavelength range of 1270-1330â¯nm. The Essential Macleod software was used to find the optimal thicknesses of the AR coatings with two different structures of AlOx/TiOx bilayer and SiNx single-layer. The simulations revealed reflectances lower than 0.5% for both AlOx/TiOx and SiNx AR structures. Furthermore, atomic layer deposition and plasma-enhanced chemical vapor deposition were used to grow the AlOx/TiOx and SiNx layers, respectively. For the fabricated structures, average reflectances of 0.2% (AlOx/TiOx) and 0.3% (SiNx) were achieved in the wavelength range of 1270-1330â¯nm. For the AlOx/TiOx bilayer, a lower transmittance of ~88% was obtained, compared with that of the SiNx single-layer of ~99%. An additional air annealing at 300â¯Â°C for 2â¯h led to a crystallization of the amorphous TiOx into anatase phase, which yielded an improved transmittance of ~99%, comparable with that of the SiNx single-layer structure. X-ray photoelectron spectroscopy revealed that the oxidation state of Ti in TiOx influenced the absorption in the near-infrared region.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Non-Crystalline Solids - Volume 489, 1 June 2018, Pages 22-26
Journal: Journal of Non-Crystalline Solids - Volume 489, 1 June 2018, Pages 22-26
نویسندگان
Yong Tae Kim, Jae Yu Cho, Jaeyeong Heo,