کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7921762 | 1511752 | 2018 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Tunability, ferroelectric and leakage studies on pulsed laser ablated (Pb0.92La0.08)(Zr0.60Ti0.40)O3 thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
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چکیده انگلیسی
(Pb0.92La0.08)(Zr0.60Ti0.40)O3 (PLZT 8/60/40) thin films were fabricated on LNO/Si<100> substrates by using a pulsed laser deposition (PLD) technique and with in-situ crystallization. The kinetics of the subsequent pyrochlore-perovskite crystallization was found to be oxygen pressure dependent in the deposition process. Conditions for obtaining phase pure, perovskite thin films using LaNiO3 (LNO) as a bottom electrode were optimized. X-ray diffraction measurements showed well-crystallized PLZT 8/60/40 thin films on a layer of LNO which served as both a template to deposit PLZT 8/60/40 on it as well as to use as a conducting bottom electrode. Atomic force microscopy (AFM) image indicates the effect of oxygen background pressure on the morphology of the films and field emission scanning electron microscopy (FE-SEM) images are used to corroborate the same. Voltage dependent capacitance study was used for the measurement of tunability in PLZT 8/60/40 thin film and was found to be 80%. Well saturated polarization vs. electric field (P-E) hysteresis loop with a remnant polarization (Pr) of â¼13.3â¯Î¼C/cm2 was observed. Leakage current studies were also done for PLZT 8/60/40 thin films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Chemistry and Physics - Volume 211, 1 June 2018, Pages 295-301
Journal: Materials Chemistry and Physics - Volume 211, 1 June 2018, Pages 295-301
نویسندگان
A.R. James, Ajeet Kumar, V.V. Bhanu Prasad, S.V. Kamat, Vajinder Singh, P. Ghoshal, Akhilesh Pandey,