کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7935022 | 1513048 | 2018 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Low-temperature solution-processed molybdenum oxide thin film as ITO modified layer for polymer solar cells
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی انرژی
انرژی های تجدید پذیر، توسعه پایدار و محیط زیست
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
In this experiment, the molybdenum oxide (MoOX) layer were fabricated by spin-coated ammonium heptamolybdate ((NH4)6Mo7O24-4H2O) solution and thermal annealing treatment. The MoOX layer is shown the deeper energy level, which is more match the highest occupied molecular orbital (HOMO) energy level of the donor. The effect of the thermal annealing of the MoOX layer on hole mobility and photovoltaic performance was investigated. It was found that the 16â¯nm thick MoOX layer has the best hole mobility and photovoltaic performance as a HEL device. From the space charge limited current (SCLC) and time of flight (TOF) curve, the MoOX layer has shown the better hole extract and transport ability compared with polyethylenedioxy-thiophene:polystyrenesulfonate (PEDOT:PSS, Clevios Al4083) layer. The photocurrent density versus effective voltage (Jphâ¯ââ¯Veff) curve, short-circuit current (JSC) and open-circuit voltage (VOC) value dependent on incident light intensity is confirmed that the weaken charge carrier recombination of MoOX-based PSCs at the open circuit condition and short circuit condition. After prolonged light illumination (during ten days), the MoOX-based PSCs is shown the better photo-stability compared with PEDOT:PSS-based PSCs and the similar decrease ratio compared with inverted PSCs.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solar Energy - Volume 170, August 2018, Pages 151-157
Journal: Solar Energy - Volume 170, August 2018, Pages 151-157
نویسندگان
Shengli Niu, Simin Xing, Xiangning Zhan, Zhiyong Liu, Ning Wang, Weiliang Zheng,