کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7970886 | 1514396 | 2014 | 13 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Glow discharge plasma as a surface preparation tool for microstructure investigations
ترجمه فارسی عنوان
پلاسما تخلیه تابش به عنوان یک ابزار آماده سازی سطح برای تحقیقات ریز ساختار
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کلمات کلیدی
ریز ساختار، آماده سازی سطح، پرتقال، تخلیه براق،
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
دانش مواد (عمومی)
چکیده انگلیسی
In order to reveal the true microstructure of a sample one must often go through tedious and time-consuming surface preparation steps. The most abundant ones are polishing and etching using hazardous chemicals. Sputtering in the glow discharge (GD) lends itself as a simple preparation tool, which supplies mild but fast removal of the deformation layer and exposure of the microstructure. However, the GD is not well studied in terms of its use for preparation of samples. In the present work the influence of GD sputtering on the sample surface is systematically studied. Some examples of the samples prepared with GD are shown. Polycrystalline Cu needs up to 8Â h to be conventionally prepared, while with GD the same surface is reached after 10Â s of sputtering. In the case of the Ti40Nb alloy, sputtering in GD is the best method for the preparation of this material only within 5Â min. The successful EBSD-measurements of the considered samples approve the good quality of the prepared surfaces. Various artifacts of sputtering are found. On the one hand they disturb the measurement, but on the other hand, they may contain useful information about the sputtered material.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Characterization - Volume 91, May 2014, Pages 76-88
Journal: Materials Characterization - Volume 91, May 2014, Pages 76-88
نویسندگان
Varvara Brackmann, Volker Hoffmann, Alexander Kauffmann, Arne Helth, Jürgen Thomas, Horst Wendrock, Jens Freudenberger, Thomas Gemming, Jürgen Eckert,