کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7971903 | 1514614 | 2018 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The evolution of hardness in Cu-W alloy thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
A series of Cu-W films with the W content higher than 17.2â¯at% were prepared by magnetron sputtering focused co-deposition technology. The micro-structures and nanoidentation hardness of the films were investigated. Except for the fcc, amorphous and bcc phases, a novel multilayered structure has been observed at the range of about 17.2-90â¯at%â¯W. Within the multilayered structure, the high-density interfaces can inhibit the motion of dislocations, which resulted in the hardness at least 2â¯GPa higher than that of the mixing rule. Depending on different microstructures, the hardness curve of the Cu-W films can be divided into three regions instead of the linear increase with the W content. From 17.2-40â¯at%â¯W, the hardness increased slowly due to lots of amorphous phase. Within 40-65â¯at%â¯W, the hardness increased linearly, which was caused by the gradually obvious multilayered structure and decreasing amorphous content. Above 65â¯at%â¯W, single-phase body-centered cubic (bcc) films were observed. In this region, the upward trend of hardness slowed down due to the porous columnar structure and gradually disappeared multilayered structure.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science and Engineering: A - Volume 729, 27 June 2018, Pages 170-177
Journal: Materials Science and Engineering: A - Volume 729, 27 June 2018, Pages 170-177
نویسندگان
Tianle Xie, Jiajun Zhu, Licai Fu, Ruiling Zhang, Na Li, Mengzhao Yang, Jiale Wang, Wen Qin, Wulin Yang, Deyi Li, Lingping Zhou,