Growth of magnesium silicide thin films on Si(100), Si(111) and SOI substrates during rapid thermal processing

► Mg2Si thin films were grown on silicon and SOI substrates using reactive diffusion. ► The silicidation of magnesium was facilitated by Rapid Thermal Processing. ► The characterization was done by X-ray diffraction and Scanning Electron Microscopy. ► The substrate morphology plays a significant role in Mg2Si formation kinetics. ► The grown magnesium silicide films are more stable on Si(111) substrate.