کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7989793 | 1515946 | 2018 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Fracture toughness of Ti-Si-N thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Fracture toughness of Ti-Si-N thin films Fracture toughness of Ti-Si-N thin films](/preview/png/7989793.png)
چکیده انگلیسی
Ti-Si-N nanocomposite thin films usually consist of a few nm sized crystals embedded in an amorphous matrix. Here we study the influence of the Si content in Ti-Si-N films - prepared by reactive magnetron sputtering using Ti targets alloyed with intermetallic TiSi2 (to obtain Si contents of 0, 10, 15, 20, 25 at.% in the targets) - on fracture toughness (KIC) and hardness. Single cantilever bending experiments show that Ti-Si-N exhibits KIC values of up to 3.0 ± 0.2 MPaâm, which are significantly higher than those for TiN with 1.9 ± 0.2 MPaâm. Complementary nanoindentation experiments reveal also a higher hardness for Ti-Si-N with 34 ± 1 GPa as compared to 26 ± 1 GPa for TiN. The film structure is carefully studied by X-ray diffraction, X-ray photoelectron spectroscopy, and high-resolution transmission electron microscopy.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: International Journal of Refractory Metals and Hard Materials - Volume 72, April 2018, Pages 78-82
Journal: International Journal of Refractory Metals and Hard Materials - Volume 72, April 2018, Pages 78-82
نویسندگان
M. Bartosik, R. Hahn, Z.L. Zhang, I. Ivanov, M. Arndt, P. Polcik, P.H. Mayrhofer,