کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8012236 1516941 2016 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Internal stress analysis of electroplated films based on electron theory
ترجمه فارسی عنوان
تجزیه و تحلیل استرس داخلی فیلم های الکترولیتی بر اساس نظریه الکترون
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فلزات و آلیاژها
چکیده انگلیسی
Cu films on Fe, Ni and Ag substrates, Ni films on Fe and Ag substrates, Ag film on Cu substrate, Cr film on Fe substrate, Ag film on Ag substrate, Ni film on Ni substrate and Cu film on Cu substrate were deposited by electroplating. The average internal stress in all films, except Cr, was in-situ measured by the cantilever beam test. The interfacial stress is very large in the films with different materials with substrates and is zero in the films with the same material with substrates. The interfacial stress character obtained from the cantilever beam bending direction is consistent with that obtained from the modified Thomas-Fermi-Dirac electron theory.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Transactions of Nonferrous Metals Society of China - Volume 26, Issue 9, September 2016, Pages 2413-2418
نویسندگان
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