کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8044064 | 1518915 | 2018 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Improved wear resistance of WS2 film by LT-deposited Ti interlayer with Ï phase structure
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
The goal of this paper was to investigate the structural/mechanical properties of arc-ion-plated Ti film deposited at ultralow temperature (166â¯K, LT-Ti film) and its effect as an interlayer on the wear resistance of sputtered WS2 film. The results revealed that the LT-Ti film mainly exhibited Ï-phase structure due to the insufficient mobility of Ti adatoms at LT surface, while the α-phase was predominated in the Ti film deposited at room temperature (RT-Ti film). The LT-Ti film showed a higher hardness than the RT-Ti film as well as the better toughness and film-substrate adhesion on steel substrates. The wear resistance of sputtered WS2 film could be significantly improved by employing the Ti films as its interlayer, especially for the LT-Ti film.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 155, September 2018, Pages 423-427
Journal: Vacuum - Volume 155, September 2018, Pages 423-427
نویسندگان
Xiaoming Gao, Jiayi Sun, Yanlong Fu, Dong Jiang, Desheng Wang, Lijun Weng, Ming Hu,