کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8044919 | 1518945 | 2016 | 27 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effects of sputtering power on microstructure and mechanical properties of TiVCr films
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
We investigated the effects of sputtering power on the microstructure of direct-current magnetron sputter-deposited TiVCr films on silicon wafer grown at room temperature. When the sputtering power was 100Â W, composite structure with amorphous and body-centered cubic (BCC) crystal phases can be observed. When sputtering power was increased to 200Â W, the composite structure was almost transformed into crystal columnar structure. Apart from interface region, the amorphous zone was composed of bundles of fine fibrous structure, whereas the BCC crystal zone contained V-shaped columnar structures without significant element segregation. Results indicated that the high sputtering power favored the formation of crystal films and the decrease of intracolumnar voids. However, a significant crack occurred, thereby widening intercolumnar voids. The film deposited at high sputtering power demonstrates slight improvement of mechanical properties.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 125, March 2016, Pages 227-233
Journal: Vacuum - Volume 125, March 2016, Pages 227-233
نویسندگان
Du-Cheng Tsai, Zue-Chin Chang, Bing-Hau Kuo, Yu-Shiuan Deng, Erh-Chiang Chen, Fuh-Sheng Shieu,