کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8045006 | 1518954 | 2015 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Transition of carbon nanotubes growth mode on NH3 plasma-modified Ni films at different plasma powers
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
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چکیده انگلیسی
Catalytic Ni films on Si substrates were modified by NH3 plasma, and carbon nanotubes (CNTs) were then grown on the Ni films by plasma enhanced chemical vapor deposition. The effect of the NH3 modification power was investigated in relation to the growth of CNTs. As the modification power increased above 20Â W, the structural phase of the Ni films evolved from pure Ni to Ni-silicide (Ni-Si) phase. This could be explained by the inter-diffusion of Ni and Si, due to the energetic ion bombardments, which resulted in the formation of Ni-Si layer on the Si substrate. In addition, the growth mode of as-grown CNTs changed from top-growth to base-growth mode after the formation of the Ni-Si phase. This indicated that the Ni-Si layer adhered to the Si substrate more strongly than the Ni layer and the formation of the Ni-Si layer led the change of the CNT growth mode.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 115, May 2015, Pages 113-116
Journal: Vacuum - Volume 115, May 2015, Pages 113-116
نویسندگان
Chang-duk Kim, Hyeong-Rag Lee, Bong-Ki Min, Hong Tak Kim,