Effects of target voltage during pulse-off period in pulsed magnetron sputtering on afterglow plasma and deposited film structure

► In pulsed sputtering, target voltage during pulse-off period was modified. ► Dense Cu film structure was obtained with positive pulse-off target voltage. ► The positive pulse-off voltage raised the potential of afterglow plasma. ► With this, incidence energy of ions from the plasma was suggested to be increased. ► The method can be used to prepare fine film structure without substrate bias.