Vector wave diffraction by a circular aperture using semicircular polarization mask

It is well-known that the imaging properties of optical systems are determined by the diffraction properties of their apertures or pupils. This enables us to study the diffraction properties of different apertures in presence of zonal masking devices. Many authors have studied the effect of circular aperture masked by circularly symmetric polarization masks. In the present paper we study the diffraction properties of a circular aperture divided into two equal semicircular apertures each of which is masked by a linear polarizer. With such masking polarizers it may be possible to compensate for asymmetric aberrations.