کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
849710 | 909272 | 2013 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment
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موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی (عمومی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment](/preview/png/849710.png)
چکیده انگلیسی
Quality of exposures in step and scan lithographic equipment (scanner) highly depends on the synchronization of wafer and reticle stage. In order to increase the synchronization between the two stages, a method of increasing the correlation through reducing the phase difference between the tracking errors of the two stages is presented. Theoretical analysis with respect to application of increasing the correlation coefficients is performed. Validation of this process is verified through simulation and the results indicate that the moving average (MA) and moving standard deviation (MSD) of the synchronization error can be reduced effectively through our method.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optik - International Journal for Light and Electron Optics - Volume 124, Issue 24, December 2013, Pages 6861–6865
Journal: Optik - International Journal for Light and Electron Optics - Volume 124, Issue 24, December 2013, Pages 6861–6865
نویسندگان
Lanlan Li, Song Hu, Lixin Zhao, Ping Ma, Jinlong Li, Lingna Zhong,