Novel TMM for analyzing evanescent waves and optimized subwavelength imaging in a multilayer structure

Here, we report the best configuration for metal-dielectric multilayer structure that recently has been used for sub-wavelength imaging beyond the diffraction limit. We have used Genetic Algorithm (GA) to achieve the best optical transfer function (OTF) calculated by a novel Transfer Matrix Method (TMM) for evanescent waves, to find optimized configuration of the structure for sub-wavelength imaging. Our optimized configuration composed of Ag–GaP with 10 nm thickness for both layers and air as the surrounding medium, shows 0.05 λ imaging resolution with 83.82% contrast at 545 nm wavelength. Also, we show that in photolithographic applications if imaging and object layers are replaced by a photoresist and quartz respectively instead of air, 0.03 λ resolution can be obtained. In contrast to the other works, we have mathematically obtained a structure that exhibits better resolution in a visible wavelength in spite of thinner layers thickness by regarding fabrication difficulties.