Research on improving the transverse resolution of binary optical element by digital-division-mask technique

We present the digital-division-mask technique for the first time to solve the problem of decline in transverse resolution, which is caused by using digital micro-mirror device (DMD) to make binary optical elements (BOEs). One high-frequency gray-tone mask can be divided into several low-frequency masks by fixed or variable low-frequency period sampling. And the superimposed lithography effect of these low-frequency masks in the spatial or temporal domain is the same as that of the original high-frequency gray-tone mask. The paper firstly analyzes the digital-division-mask technique in theory and describes the feasibility and advantages. Then taking the diffractive surface fabrication of refractive–diffractive hybrid lens as an example, we conclude that the digital-division-mask technique improves the edge sharpness of lithography pattern, and enhances the diffractive efficiency of BOEs by experiment.