کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
852663 909406 2008 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
In situ surface topography measurement method of granite base in scanning wafer stage with laser interferometer
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی (عمومی)
پیش نمایش صفحه اول مقاله
In situ surface topography measurement method of granite base in scanning wafer stage with laser interferometer
چکیده انگلیسی

Topography of a granite surface has an effect on the vertical positioning of a wafer stage in a lithographic tool, when the wafer stage moves on the granite. The inaccurate measurement of the topography results in a bad leveling and focusing performance. In this paper, an in situ method to measure the topography of a granite surface with high accuracy is present. In this method, a high-order polynomial is set up to express the topography of the granite surface. Two double-frequency laser interferometers are used to measure the tilts of the wafer stage in the X- and Y-directions. From the sampling tilts information, the coefficients of the high-order polynomial can be obtained by a special algorithm. Experiment results shows that the measurement reproducibility of the method is better than 10 nm.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optik - International Journal for Light and Electron Optics - Volume 119, Issue 1, 7 January 2008, Pages 1–6
نویسندگان
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