Study on antireflective glass by liquid-phase etching

Sodium oxide, calcium oxide and metal oxide composed the glass was selectively etched by fluorosilicic acid saturated by silicon dioxide, leaving the surface of the glass substantially consisted of silicon dioxide. Thus, an antireflective film was formed on the appearance of the glass. The properties of the as-gained antireflective glass were measured by scanning electron microscope, spectrophotometer and then theoretically analyzed. The results indicates that the glass has a porous antireflective film and its transmittance increases by 2.8∼7.0% by the light wavelength in the range of 350∼1000 nm, with 3.0%, 7.0% and 2.8% at 350 nm, 550 nm, 1000 nm. Finally, the thickness and refractive index of the antireflective film on the as-gained glass were theoretically calculated.