Determination of the Thickness and Optical Constants of ZrO2 by Spectroscopic Ellipsometry and Spectrophotometric Method

ZrO2 thin films deposited on silicon wafer and glass substrate by dc magnetron sputtering with different deposition time. Film thickness and refractive index of ZrO2 films have been studied by using spectroscopic ellipsometry (SE) and spectrophotometric method (SM). The film thicknesses of both methods were compared with the film thickness which determined from field emission scanning microscopy (FE-SEM). The results found that the films thickness was increased when the deposition time was increased and all films still remained highly transparent. Finally, our results suggest that SE can effectively to characterize the film thickness and optical properties of ZrO2 films