Some properties of double designs in terms of lee discrepancy

Doubling is a simple but powerful method of constructing two-level fractional factorial designs with high resolution. This article studies uniformity in terms of Lee discrepancy of double designs. We give some linkages between the uniformity of double design and the aberration case of the original one under different criteria. Furthermore, some analytic linkages between the generalized wordlength pattern of double design and that of the original one are firstly provided here, which extend the existing findings. The lower bound of Lee discrepancy for double designs is also given.