کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8948534 | 1645669 | 2018 | 20 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Microstructure evolution of polycrystalline Ti2AlN MAX phase film during post-deposition annealing
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
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چکیده انگلیسی
Polycrystalline Ti2AlN MAX phase films were fabricated by post-deposition annealing of Ti-Al-N film at annealing temperature in the range of 600â°C-800â°C in high vacuum. The temperature-dependent microstructure evolution from Ti-Al-N film to polycrystalline Ti2AlN film has been investigated. It was found that after post-deposition annealing above 600â°C, the as-deposited amorphous Ti-Al-N film transformed to polycrystalline Ti2AlN film. With the increase of annealing temperature from 600â°C to 700â°C, the crystallinity of polycrystalline Ti2AlN film was improved. At 800â°C, the surface Ti2AlN grains completely decomposed and transformed to TiN phase while inner grains was partial decomposed and surrounded by amorphous Al-rich phase. The polycrystalline Ti2AlN film exhibited a highest hardness of 34.1âGPa while the hardness of amorphous Ti-Al-N film was only 24.2âGPa. The mechanism of texture changes and phase transformation as well as its effect on thermal stability was also discussed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of the European Ceramic Society - Volume 38, Issue 15, December 2018, Pages 4892-4898
Journal: Journal of the European Ceramic Society - Volume 38, Issue 15, December 2018, Pages 4892-4898
نویسندگان
Tao Wang, Zhe Chen, Guoqing Wang, Lei Wang, Guojun Zhang,