کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9566817 | 1503712 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Laser conditioning and multi-shot laser damage accumulation effects of HfO2/SiO2 antireflective coatings
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Laser conditioning and multi-shot laser damage accumulation effects of HfO2/SiO2 antireflective coatings Laser conditioning and multi-shot laser damage accumulation effects of HfO2/SiO2 antireflective coatings](/preview/png/9566817.png)
چکیده انگلیسی
Laser conditioning effects of the HfO2/SiO2 antireflective (AR) coatings at 1064Â nm and the accumulation effects of multi-shot laser radiation were investigated. The HfO2/SiO2 AR coatings were prepared by E-beam evaporation (EBE). The single-shot and multi-shot laser induced damage threshold was detected following ISO standard 11254-1.2, and the laser conditioning was conducted by three-step raster scanning method. It was found that the single-shot LIDT and multi-shot LIDT was almost the same. The damage mostly >80% occurred in the first shot under multi-shot laser radiation, and after that the damage occurring probability plummeted to <5%. There was no obvious enhancement of the laser damage resistance for both the single-shot and multi-shot laser radiation of the AR coatings after laser conditioning. A Nomarski microscope was employed to map the damage morphology, and it found that the damage behavior is defect-initiated for both unconditioned and conditioned samples.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 245, Issues 1â4, 30 May 2005, Pages 335-339
Journal: Applied Surface Science - Volume 245, Issues 1â4, 30 May 2005, Pages 335-339
نویسندگان
Yuanan Zhao, Tao Wang, Dawei Zhang, Jianda Shao, Zhengxiu Fan,