کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9566905 | 1503709 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Time transient investigation of photo-induced electron localization at atomic step edges of Si (1Â 1Â 1)
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موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
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چکیده انگلیسی
To analyze a photo-induced electron localization process at atomic step edges of the Si-native oxide interface, the time transient signal of Kelvin force microscopy with a UV laser light source was investigated. The time constant of the photo-induced process for a laser wavelength λ = 325 nm had a linear dependence with respect to the laser power Pw. An electron transition model that takes into account photo- and thermal-effects revealed that the photo-induced localization is dominant for Pw > 0.54 mW. The small photo irradiation effect occurring at λ = 441.6 nm is explained by the low photo absorption efficiency for visible light.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 248, Issues 1â4, 30 July 2005, Pages 14-18
Journal: Applied Surface Science - Volume 248, Issues 1â4, 30 July 2005, Pages 14-18
نویسندگان
Masashi Ishii, Bruce Hamilton,