کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9566994 1503709 2005 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Laser photodeposition of thin semiconductor films from iron carbonyl vapors
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Laser photodeposition of thin semiconductor films from iron carbonyl vapors
چکیده انگلیسی
Iron carbonyl vapors (Fe(CO)5) were used for laser chemical vapor deposition (LCVD) of nanometric structures based on iron oxides, Fe2O3−x (0 ≤ x ≤ 1). The deposition process was done by focused Ar+ laser radiation (λL =  488 nm) on Si substrate surface with a power density about 102 W/cm2 at vapor pressure of 666 Pa. Content analysis of deposited films made by auger electron spectroscopy (AES) revealed the presence of iron (Fe), carbon (C) and oxygen (O). Scanning electron microscopy (SEM) showed that the deposited films surface had nanometric cluster structure. The films exhibited semiconductor properties in the range 170-340 K.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 248, Issues 1–4, 30 July 2005, Pages 475-478
نویسندگان
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