کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9567110 | 1503710 | 2005 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Real-time analysis of UV laser-induced growth of ultrathin oxide films on silicon by spectroscopic ellipsometry
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Real-time analysis of UV laser-induced growth of ultrathin oxide films on silicon by spectroscopic ellipsometry Real-time analysis of UV laser-induced growth of ultrathin oxide films on silicon by spectroscopic ellipsometry](/preview/png/9567110.png)
چکیده انگلیسی
In this work atomic oxygen was created by the photochemical dissociation of O2 with a F2 laser at 157 nm and of N2O with an ArF laser at 193 nm. With this technique ultrathin (<6 nm) amorphous silicon oxide films (a-SiOx and a-SiO2) were grown onto hydrogen terminated Si(1 1 1), Si(1 0 0), and amorphous silicon (a-Si) substrates. The oxidation process was monitored in real-time by spectroscopic ellipsometry. Different ellipsometric models are applied to characterize the interface. The influence of temperature, atmosphere, and of the surface morphology of the substrate was studied. Although the kinetics of oxidation is affected by the gas phase chemistry and temperature, the oxidation conditions do not influence appreciably the structure of the growing interface. The interface formed by this low-temperature oxidation process seems to be characteristic for the structure of the substrate surface. It consists of amorphous silicon with a low content of oxygen (a-SiOx). The thickest a-SiOx interface layer grew on the Si(1 1 1):H surface with a thickness of (0.8 ± 0.3) nm and a stoichiometric index x of (0.40 ± 0.15), whereas on Si(1 0 0):H a (0.40 ± 0.15) nm thick SiOx interface of nearly pure amorphous silicon was observed. Additionally X-ray photoelectron spectroscopy (XPS) and FTIR spectroscopy measurements were carried out to confirm the ellipsometric results.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 247, Issues 1â4, 15 July 2005, Pages 204-210
Journal: Applied Surface Science - Volume 247, Issues 1â4, 15 July 2005, Pages 204-210
نویسندگان
Patrik Patzner, Andrey V. Osipov, Peter Hess,